Annealing Effect on the Growth of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition (PLD)
Annealing Effect on the Growth of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition (PLD)

Sarmad S.Kaduory; Ali A.Yousif; Adawiya J. Haider; Khaled Z.Yahya

Volume 31, 4 B , April 2013, , Page 460-470

https://doi.org/10.30684/etj.31.4B.6

Abstract
  In this work, Nanostructured TiO2 thin films were grown by pulsed laser deposition (PLD) technique on glass substrates at 300 °C. TiO2 thin films were then annealed at 400-600 °C ...  Read More ...