Print ISSN: 1681-6900

Online ISSN: 2412-0758

Author : A.Mohamed, Farhan


Transparent Oxide MgO Thin Films Prepanred By Reactive Pused Laser Deposition

Evan T. Salem; Farhan A.Mohamed

Engineering and Technology Journal, 2010, Volume 28, Issue 4, Pages 723-729

Transparent dielectric thin films of MgO have been deposited on glass
substrates at different oxygen pressure between (50-300) mbar using a pulsed laser
deposition technique to ablation of Mg target in the presence of oxygen as reactive
atmosphere. Structural, and optical, properties of these films have been
investigated. The films crystallize in a cubic structure and X-ray diffraction
measurements have shown that the polycrystalline MgO films prepared at oxygen
pressure (200) mbar and substrate temperature (150°C) with (111) and (002)
orientations. The films deposited at oxygen pressure between (150-300) mbar and
substrate temperature (150°C) exhibited highest optical transmittivity (>80%) and
the direct band gap energy was found to be 5.01 eV at oxygen pressure (200) mbar.
The measured of the resistivity of the film prepared at oxygen pressure (200) mbar
and substrate temperature (150°C) was 1.45x107Ω cm.