The Effect of Thermal Annealing on the Diffusion Profile of Nickel in GaAs Substrates
The Effect of Thermal Annealing on the Diffusion Profile of Nickel in GaAs Substrates

Aseel A.K. Hadi

Volume 27, Issue 5 , March 2009, , Page 880-885

https://doi.org/10.30684/etj.27.5.2

Abstract
  Diffusion of nickel in GaAs has been studied at 950ºC. The diffusion wasenhanced during limited interval and for different quantities of As. Nickel atomshad diffused in the beginning ...  Read More ...