Oday A. Hamadi; Ban A.M. Bader; Afnan K. Yousif
Abstract
In this work, plasma-induced matrix etching technique was used to fabricate p-n junctionsolar cells and their electrical characteristics were studied. Results showed reasonableimprovement ...
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In this work, plasma-induced matrix etching technique was used to fabricate p-n junctionsolar cells and their electrical characteristics were studied. Results showed reasonableimprovement in solar cell characteristics when compared to the characteristics of thecells fabricated without etching process or by conventional thermal evaporationtechnique. The maximum conversion efficiency of the fabricated cells was about(2.15%) at irradiation power of (90W/cm2) and the fill factor was (56.90%).الخصائص