Structural and Optical Characterization of Nickel Oxide Thin Films Prepared by Spray Pyrolysis Technique
Structural and Optical Characterization of Nickel Oxide Thin Films Prepared by Spray Pyrolysis Technique

Fadheela H. Oleiwe

Volume 33, 8B , October 2015, , Page 1503-1512

https://doi.org/10.30684/etj.2015.117191

Abstract
  In this research, Nickel oxide (NiO) thin film were prepared by using nickel chloride ( NiCl2.6H2O) on glass substrate by using Spray Pyrolysis technique. The Structural and optical ...  Read More ...
Investigation of Structural, Optical and Electrical Properties of ZnO Prepared Thin Film by PLD
Investigation of Structural, Optical and Electrical Properties of ZnO Prepared Thin Film by PLD

Samer. Y. Al-Dabag

Volume 33, 5B , June 2015, , Page 838-847

https://doi.org/10.30684/etj.33.5B.9

Abstract
  In this paper , Zinc Oxide (ZnO) films were grown on glass substrates by Pulsed Laser Deposition (PLD) technique at room temperature under the vacuum pressure of 3×10−3 ...  Read More ...
Structural and Optoelectronical Properties of In2S3 Thin Films Prepared by CSP Technique for Solar Cell Application
Structural and Optoelectronical Properties of In2S3 Thin Films Prepared by CSP Technique for Solar Cell Application

Baha. T. Chiad; M. Sh. Essa; M.D. Abd-aljabar; J.A. Abd-aula

Volume 32, 4B , April 2014, , Page 629-636

https://doi.org/10.30684/etj.32.4B.2

Abstract
  Indium Sulfide In2S3 window layer have been prepared by Chemical Spray Pyrolysis (CSP) at substrate temperate Equal (573 K) from Indium chloride and Thiourea were In/S ratio equal 1.2/8 ...  Read More ...
Annealing Effect on the Growth of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition (PLD)
Annealing Effect on the Growth of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition (PLD)

Sarmad S.Kaduory; Ali A.Yousif; Adawiya J. Haider; Khaled Z.Yahya

Volume 31, 4 B , April 2013, , Page 460-470

https://doi.org/10.30684/etj.31.4B.6

Abstract
  In this work, Nanostructured TiO2 thin films were grown by pulsed laser deposition (PLD) technique on glass substrates at 300 °C. TiO2 thin films were then annealed at 400-600 °C ...  Read More ...