Print ISSN: 1681-6900

Online ISSN: 2412-0758

Keywords : ZnO films


Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon

Uday Muhsin Nayef; Mohammed Waleed Muayad

Engineering and Technology Journal, 2014, Volume 32, Issue 6, Pages 1106-1110

ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using porous silicon more than using glass and that's come from sponge like structure of porous silicon and large spastic area of porous silicon (about 500m2/cm3).

Effect of Substrate Temperature on the Structural and Morphological Properties of Nano-structure ZnO films by Pulsed Laser Deposition

Adawiya J. Haider; Afnan k. yousif

Engineering and Technology Journal, 2011, Volume 29, Issue 1, Pages 58-64

In this work, ZnO thin films were grown on sapphire (0001) substrate by
Pulsed Laser Deposition using SHG with Q-switched Nd:YAG pulsed laser operation
at 532nm in O2 gas ambient 5×10-2 mbar at different substrate temperatures varying
from room temperature to 500°C. The influence of the substrate temperature on the
structural and morphological properties of the films were investigated using XRD and
SEM. As result, at substrate 400°C, a good quality and crystalline films were deposited
that exhibits an average grain size (XRD) of 22.42nm with an average grain size
(SEM) of 21.31nm.