Print ISSN: 1681-6900

Online ISSN: 2412-0758

Keywords : Switching

Impact of Laser Induced Forward Transfering on Transfer of Escherichia Coli Bacteria

Adawiya J. Haider; Amer T. Tawfeeq; Amar H. Jareeze

Engineering and Technology Journal, 2014, Volume 32, Issue 5, Pages 885-891

Laser Induced Forward Transfer (LIFT) is a technique uses to print different materials with high spatial resolution for microarray preparation. In this work, the mechanism in which LIFT process effect E.coli bacteria used to produce microarray droplets from a liquid solution thin film coated a glass slide previously coated with gold of 65nm thick which was used as a laser absorbing layer. The transferred bacteria was achieved at laser fluence of 10 J/cm2 and 100 µm distance between donor and receptor substrates.
The purpose of using such a technique was to assess the impact of laser on the viability of the transferred bacteria. Scanning electron microscope observation indicated that E.coli bacterial cells integrity was maintained during the process. The bacteria was viable as tested using MacConkey agar culture media.

Thin Films Ablation by Induced Forward Transfer Technique

Adawiya J. Haider; Iman H. Hadi

Engineering and Technology Journal, 2012, Volume 30, Issue 8, Pages 1405-1414

Laser-Induced Forward Transfer (LIFT) is a technique which enables the
controlled transfer of a thin film material from a transparent carrier (donor) to a
receiver substrate (acceptor). The receiver substrate is usually placed in parallel
and close to the thin film source under air or vacuum conditions. In this work
microdeposition of gold (Au) and Copper (Cu) thin films were deposited on glass
substrate by Pulsed Laser Deposition (PLD). These thin films were irradiated by a
single pulse and transferred to a silver (Ag) and silicon (Si) receiver substrates. The
laser source used for this study was a Nd-YAG Q-Switching second harmonic
generation (SHG) Pulsed Laser with a wavelength 532nm, repetition rate 1-6 Hz
,and pulse duration 10ns. Deposited size, morphology and adhesion to the receiver
substrate as a function of applied laser fluence are investigated.

Effect of Substrate Temperature on the Structural and Morphological Properties of Nano-structure ZnO films by Pulsed Laser Deposition

Adawiya J. Haider; Afnan k. yousif

Engineering and Technology Journal, 2011, Volume 29, Issue 1, Pages 58-64

In this work, ZnO thin films were grown on sapphire (0001) substrate by
Pulsed Laser Deposition using SHG with Q-switched Nd:YAG pulsed laser operation
at 532nm in O2 gas ambient 5×10-2 mbar at different substrate temperatures varying
from room temperature to 500°C. The influence of the substrate temperature on the
structural and morphological properties of the films were investigated using XRD and
SEM. As result, at substrate 400°C, a good quality and crystalline films were deposited
that exhibits an average grain size (XRD) of 22.42nm with an average grain size
(SEM) of 21.31nm.