Preparation and Characterization of (Tio2-Sno2) Thin Films by Pulsed Laser Deposition
Engineering and Technology Journal,
2014, Volume 32, Issue 4, Pages 658-665
AbstractIn this work, mixed oxide (TiO2-SnO2) thin films were grown on Si (111) and glass substrates by pulsed laser deposition (PLD) method. The influences of increasing amounts of SnO2 were investigated. The X-ray diffraction results show the peaks position of the plane was shifted towards higher angle values with increasing amounts of SnO2. The surface morphology of the deposits materials was also studied by using a scanning electron microscope(SEM) The results show that, the grain sizes decreases with increasing SnO2 content from the largest value (53.6)nm to smallest value (25.5) nm. From UV-visible spectroscopy, the distinct variations in the transmission spectra, and optical energy gap, of the thin films were also observed.
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