In the present work, Bismuth and Bismuth trioxide thin films were prepared using reactive pulse laser deposition technique. Different laser fluence was employed ranged from (1.8 J/cm2- 9.8 J/cm2) to investigatedthe physical properties. X –Ray diffraction result show a structure for the prepared films with monoclinic, tetragonal, and nonstoichiometric phases beside bismuth, while the atomic force microscopic result show grain size ranged from (33.48nm -131.6 nm) with different laser fluence. Optical properties result gave an energy gap value in the range of bismuth oxide (1.2-2.9 eV).