Nanocrystalline Copper Oxide films were deposited on glass substrates by plasma dc sputtering. The effected of discharge current on the structural and optical properties of sputtered films were studied .X-ray diffraction peak of Cu2O (111) and Cu4O3 (112) direction was observed at discharge current of (15-30) mA when annealed at 500 0C for 2 h. The optical energy gap for the prepared films is estimated to be in (2.05- 2.3) eV range. It was found that the effect of preparation conditions on thin films thickness strongly depends on the discharge current of argon plasma.