1 Research Centre of Nanotechnology and Advanced Materials, University of Technology, Baghdad, Iraq

2 Department of Physics, Al Mustansyriah University, Baghdad, Iraq.

3 DNA Research Center, Al Nahrain University, Baghdad, Iraq.


In this work, ZnO thin films have been deposition using pulsed laser
deposition (PLD) method on glass and Si (111) substrates at different laser
pulsed. Some properties of ZnO thin films were studied, the results of XRD
explain Zinc oxidethin films with hexagonal wurtzite structure with thickness
about 155and 200 nm. FTIR spectrum shows the existence of Zn – O bond that
appear the texture of ZnOnanostructures. The root mean square of thin films
were explained with the range 8.31–15.2 nm with particle size about 41.6 -
45.41and was only slightly dependent on number of laser pulses. Zinc oxide thin
films showed transmittance of over 80% .The photovoltaic characteristics
indicated an increase the short circuit current-open circuit voltage with
illumination power as increased number of laser pulses resulted increasing of
film thickness.


Main Subjects