The Effects of Sputtering Time on Cds Thin Film Solar Cell Deposited by DC Plasma Sputtering Method
Engineering and Technology Journal,
2018, Volume 36, Issue 2C, Pages 123-127
AbstractCdS thin films of different thickness have been prepared by dc sputtering technique on glass slides for a window layer of solar cells. The CdS target were sputtered in different sputtering times (1,1.5,2.5,3) hrs, working pressure (2×10-2) mbar and discharge voltage(2) kV.The structure of the nanoparticles films was investigated of CdS thin films by X-ray diffraction (XRD).The XRD patterns showed that the films were hexagonal (wurtzite) structure having strong preferential orientation along the (002) plane with particle size in the range of (41.04-41.46-41.88-42.53) nm, the peak at (002) preferred orientations of the films are shifted a little from left to right side and films converted to crystalline form. The morphology of the nanoparticles films was studied by atomic force microscopy (AFM) which indicates that the average grain size of CdS thin film is in the range of (41.3-44.2-51.6-50.08) nm. The roughness of films surface increases with increasing the sputtering time, which can be useful for the solar cell.
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