Authors

• Saria D. Al-Alagawi
• Manal A. Aboud

Abstract

In this work, an optical method was used for the determination of the
crystalline orientation of the chemically etched silicon surfaces in the (111),
(110) and (100) planes. This method depends on the light patterns of laser
beam reflected from the monocrystalline surfaces. The optical method submits
acceptable measuring accuracy and well-distinguished folded patterns.

Keywords

• Crystalline orientation
• Crystallographic orientation
• Optical reflectogram technique