Authors
Abstract
Cuprous oxide films have been deposited by chemical bath method from
alkaline solution at pH=8.6.The deposited oxides were investigated using X-ray
diffraction, surface morphology, optical and electrical measurements. It is shown
that during deposition two different stages could be distinguished. the band gap of
the deposited film tuned from 2eV to 2.5 eV by decreasing deposition time. X-ray
diffraction (XRD) measurements showed formation of CuO and Cu2O phases, the
structure shows a thickness dependent. The grain size of as deposited and
annealed films at different temperatures were calculated from SEM data, The
results showed that the grain size of films increased with increasing deposition
time and annealing temperature. The resistivity of the films had significantly
decreased with increased deposition time, also films activation energy decreased
with increasing thickness
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