Optical and Structure Properties of MgxZn1-xO Thin Films by Pulsed Laser Deposition
Engineering and Technology Journal,
2009, Volume 27, Issue 14, Pages 2653-2665
AbstractIn this study, the optical and structure properties of MgxZn1-xO thin films is reported. The MgxZn1-xO thin films were prepared on Glass substrates by Q-switch second harmonic Nd:YAG laser deposition technigue with wavelength of 532nm from a ZnO target mixed with Mg of (0-0.3) wt% , and the films deposited at temperature (250°C).
The optical properties were characterized by transmittance and absorption spectroscopy measurements. For all the films the average transmission in the U.V (200-900) nm wavelength region was over 85% and the absorption edge shifted to a shorter wavelength as the magnesium concentration increased. The optical energy gap of MgxZn1-xO thin films, measured from transmittance spectra could be controlled between (3.3eV and 4.2eV) by adjusting magnesium concentration. X-ray diffraction was used to investigate the structure of the film. The refractive index of hexagonal MgxZn1-xO thin films decreases with the Mg concentration increase, such as at the wavelength of (500nm) the refractive index decreases from 1.93 to 1.85 as x increase from 0.15 to 0.3. The extinction coefficient and the complex dielectric constant were also investigate.
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