Engineering and Technology Journal

Abstract

In this paper thin films of Tin oxide SnO2 was prepared by spray pyrolyess method
on glass and pure silicon substrates at deposition temperature(300,400,500) Cᵒ, from Tin
chloride at concentration(0.1 M) .
The films thickness were about 0.1 ±0.02 μm and Atomization rate was about
(1 nm/s).
The test was done on prepared film by XRD and optical microscopy addition to
sensitivity to nitrous oxide gas at different test temperature (25, 50, 75,100) Cᵒ.
Result shows that the crystallization increased by increasing deposing temperature
and the sensitivity increased by rising the gas concentration or temperature.