The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films

Authors

• Azhar Sadkhan, Office of the Vice President for Scientific Affairs and Post Graduate Studies, University of Technology Baghdad, Iraq.Follow
• Suaad Mohammed, Ministry of Education, Baghdad, Iraq.
• Mohammed Khalaf, Ministry of Science and Technology, Department of Materials Research, Baghdad, Iraq.

Keywords

Titanium dioxide, Thin films, RF sputtering

Document Type

Research Paper

Abstract

In this paper, RF Magnetron sputtered TiO2 thin films deposited onglass slices at various powers (75,100,125 and 150) Watt for (1.5) hour anddifferent thickness (62.5-88-118 and 132.6) nm, the TiO2 thin films annealed with400°C for 2 hour and the morphology and structure of these films are describedby X-ray diffraction XRD and atomic force microscopy AFM to show the phasestructure. X-ray diffraction investigation uncovered that the crystalline size of theTiO2 thin films displays an expanding pattern with increasing the sputteringpower. The preferred orientation of (101) was watched for the films depositedwith sputtering power of (75,100,125 and 150) Watt.

Recommended Citation

Sadkhan, Azhar; Mohammed, Suaad; and Khalaf, Mohammed (2026) "The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films," Engineering and Technology Journal: Vol. 36: Iss. 2, Article 21.
DOI: https://doi.org/10.30684/etj.36.2B.6

DOI

10.30684/etj.36.2B.6

First Page

128

Last Page

130