Adawiya J. Haider; Afnan k. yousif
Abstract
In this work, ZnO thin films were grown on sapphire (0001) substrate by Pulsed Laser Deposition using SHG with Q-switched Nd:YAG pulsed laser operation at 532nm in O2 gas ambient 5×10-2 ...
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In this work, ZnO thin films were grown on sapphire (0001) substrate by Pulsed Laser Deposition using SHG with Q-switched Nd:YAG pulsed laser operation at 532nm in O2 gas ambient 5×10-2 mbar at different substrate temperatures varying from room temperature to 500°C. The influence of the substrate temperature on the structural and morphological properties of the films were investigated using XRD and SEM. As result, at substrate 400°C, a good quality and crystalline films were deposited that exhibits an average grain size (XRD) of 22.42nm with an average grain size (SEM) of 21.31nm.